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Atmospheric-pressure spatial ALD technology for depositing nanoscale metal-oxide coatings on substrates (wafers, glass, plastics, paper, fabrics) near room temperature.
About
We have developed the equipment and processes for atmospheric-pressure spatial atomic layer deposition of nanoscale metal-oxide coatings on a variety of surfaces (wafers, glass, plastics, paper, fabrics) near room temperature. This technology can be applied in a variety of industries where high-throughput, large-area nanoscale coatings are needed (photovoltaic, packaging, batteries, textiles, flexible electronics, etc.).
Key Benefits
Compared to conventional atomic layer deposition (ALD), our deposition method is 1-2 orders of magnitude faster and does not require a vacuum chamber. This facilitates large-area, high-throughput coating of surfaces at lower cost.
Applications
Functional coatings: barrier layers for consumer-packaged goods, photovoltaics, batteries, functional textiles, flexible electronics, anti-corrosion coatings, etc.