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Innovations

                                        
                                    Published
                            
                Manufacturing & Production
            
Plasma Enhanced CVD Processing
                Highly scalable, low capital infrastructure process technology.
Extend the capability of chemical vapour deposition (CVD) and etching processes at atmospheric pressure.
            
By
                            University of Salford
                        
Reference Number  
                00984
            
Last Update  
                 Nov 15, 2021
            
                                    Published
                            
                Sciences
            
Chemical Vapour Deposition
                The Direct Liquid Injection technology allows the deposition of the widest range of materials from the periodic table with a perfect control of the stoichiometry.
            
By
                            Franck Laporte
                        
Reference Number  
                01111
            
Last Update  
                 Nov 15, 2021
            
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