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The Direct Liquid Injection technology allows the deposition of the widest range of materials from the periodic table with a perfect control of the stoichiometry.
About
The processes can be: Direct Liquid Injection Chemical Vapor Deposition (DLI-CVD) or Direct Liquid Injection Atomic Layer Deposition (DLI-ALD) depending on the materials to be deposited and the aspect ratio of the substrate. Unique process capabilities: Perfect control of precursor flow (control of the liquid flow) Precursor tanks remains at room temperature Utilization of thermally unstable chemical precursors Utilization of low vapor pressure chemical precursors (solids) Utilization of diluted chemical precursors (safer utilization) Accurate control of doping level Fast vapor switch on/off Coriolis liquid flow meters (no need for calibration)
Key Benefits
Low cost of ownership, low maintenance requirements Thermalized walls technology, deposition only on substrate No complicated shower heads Optimized integration of vaporizers Embedded Direct Liquid Injection (DLI) vaporizers State of the art liquid panel for easy precursor management Reactor by-pass (multi layer interface control) Multi process capability: CVD, ALD, pulse pressure CVD, RTP…