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That it provides a simple method compatible with organic device fabrication, for chlorinating the surface and increasing the work function of conductive layers.
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Summary In summary, it has been demonstrated that Cl.sub.2 plasma treatment is a simple and effective method for surface modification of the ITO anode used in OLEDs and other organic electronics. The resultant chlorinated ITO had a work function about 0.95 eV higher than that of ITO treated with O.sub.2 plasma, leading to more efficient hole injection into organic layers. At brightness about 10.sup.4 cd/m.sup.2, OLEDs fabricated on Cl.sub.2 plasma-treated ITO/glass had an about 30% higher EQE and an about 74% higher power efficiency compared to similar devices on O.sub.2 plasma-treated substrates. It has also been found that Cl.sub.2 plasma treatment created a more stable ITO/organics interface, which markedly improved the OLED half-life by a factor of about 61, presumably due to the suppression of material crystallization and/or indium diffusion at the ITO/organics interface. The developed dry plasma process is very compatible with the fabrication of various organic electronics and highly scalable for mass production.