Maskless Nano-Templating

About

Dip pen nanolithography (DPN) allows desktop and cost-effective patterning of substrates and fabrication of structures on micro- and nano- scales. Manufacturing capabilities of this system allow a range of devices such as protein nanoarrays and biosensors to be developed. A wide variety of "inks" can be used for this process, including small organic molecules (thiols and silanes), nanomaterials, biomolecules and macromolecules. Crucially, however, such technology is limited to a restricted range of substrates. We have devised a maskless nano-templating method offering an almost limitless range of substrates, making DPN a more versatile tool. A nano-template is created by coating the substrate with a thin layer of polymer which is then selectively removed in a desired pattern using solvent applied by the tip. The selected material, such as metal or biological compound is then applied to reservoirs created by the template before the polymer is removed to leave the nanostructure in place. As the reaction between the substrate and material is carried out in a reservoir the incubation period can be increased, allowing a wider range of combinations to be used. This may in turn increase the cost effectiveness of the process as cheaper materials and substrates can be used, such as polymers and glass. Furthermore, blocking agents to prevent non-specific adsorption may not be required and the process is compatible with photolithography if the polymer use is a photoresist. These modifications may allow DPN to be applied to a wider range of applications from the production of nanowires and nanosensors to development of single cell assays. A patent application has been filed for this technology. We are seeking partners to help develop, validate and commercialise this technology. Please press “Connect” and we will send you 6 supporting Powerpoint slides on this technology. When contacting us, pelase quote reference number 5386.